Ceramic Sputtering Targets

Using our in house forming and machining capability we manufacture one piece targets up to 20 diameter or 14 square tile arrays up to 3 meters and rotary targets up to 4 meters.

Ceramic sputtering targets.

Our in house capabilities employ manufacturing methods that produce sputtering targets in the geometry that best fits your needs. Sputtering targets the technical ceramics business of morgan advanced materials are specialists in the manufacture of ceramic sputtering targets for the semiconductor industry manufactured from 94 99 99 alumina and chemical vapor deposition cvd silicon carbide sic for physical vapour deposition pvd applications. Oxide ceramic sputtering targets. Stanford advanced materials sam corporation is a global supplier of various sputtering targets such as metals alloys oxides ceramic materials.

At that time we promised to address the analogous process of how ceramic or complex composite material sputtering targets are prepared. A while back january 2016 we discussed a brief but fundamental description of what the basic processes are associated with the production of elemental and metal alloy sputtering targets. Changsha xinkang advanced materials co ltd is a professional producer of pvd coating materials we engaged in producing and suppling the most suitable and high quality metal sputtering targets metal alloy sputtering targets ceramic sputtering targets and evaporation materials for the field of semiconductor and micro electronics optical glass coating decoration solar photovoltaic coating. We further described the consolidation steps associated with this manufacturing process referred to as simple hot pressing.

We manufacture sputtering targets in a wide range of materials sizes forms and configurations. In our most recent blog we briefly described the process of sintering ceramic type sputtering target materials via. Sci engineered materials provides ceramic and metal sputtering targets for use in sputtering and laser ablation including cathodic arc sources e beam and pulsed laser deposition pdl. We supply bonded planar ceramic sprayed rotatable indium bonded metal or ceramic rotatable and monolithic metal target evaporation solutions.

Oxide ceramic sputtering targets are the most common ones among advanced ceramic sputtering targets. Sputtering targets our high purity low spit targets can resolve your concerns for uniformity reproducibility and homogeneity. The powder metallurgical process referred to as sintering. That time has now come.

What was described was how sintering is an. New species comes into being explosively in recent two to three decades.